X-ray reflectometry and its application to studying the laser evaporation of an oxide film from the silicon surface-Reference-Cited by-同舟云学术

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X-ray reflectometry and its application to studying the laser evaporation of an oxide film from the silicon surface

Published:2003-04 Issue:4 Volume:48 Page:508-513
ISSN:1063-7842
Container-title:Technical Physics
language:en
Short-container-title:Tech. Phys.

Author:

Petrakov A. P.

Publisher

Pleiades Publishing Ltd

Subject

Physics and Astronomy (miscellaneous)

Link

http://link.springer.com/content/pdf/10.1134/1.1568495.pdf

Reference30 articles.

1. A. V. Andreev, Usp. Fiz. Nauk 145, 113 (1985) [Sov. Phys. Usp. 28, 70 (1985)].

2. A. P. Petrakov and E. A. Golubev, Poverkhnost: Fiz. Khim. Mekh., No. 9, 15 (2000).

3. V. A. Bushuev and A. P. Petrakov, Fiz. Tverd. Tela (St. Petersburg) 35, 355 (1993) [Phys. Solid State 35, 181 (1993)].

4. V. A. Bushuev and A. P. Petrakov, Zh. Tekh. Fiz. 70(5), 28 (2000) [Tech. Phys. 45, 613 (2000)].

5. A. A. Lomov, V. A. Bushuev, and V. A. Karavanskii, Kristallografiya 45, 915 (2000) [Crystallogr. Rep. 45, 842 (2000)].

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigations of nanostructured porous PbTe films with x-ray diffractometry and reflectometry;SPIE Proceedings;2009-10-23

2. Relative x-ray reflectometry of discrete layered structures;Technical Physics Letters;2007-03

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