Plasma-chemical technology of treatment of halogen-containing waste including polychlorinated biphenyls-Reference-Cited by-同舟云学术

Plasma-chemical technology of treatment of halogen-containing waste including polychlorinated biphenyls

Published:2010-12 Issue:4 Volume:17 Page:605-612
ISSN:0869-8643
Container-title:Thermophysics and Aeromechanics
language:en
Short-container-title:Thermophys. Aeromech.

Author:

Gusarov E. E.,Malkov Yu. P.,Stepanov S. G.,Troshchinenko G. A.,Zasypkin I. M.

Publisher

Pleiades Publishing Ltd

Subject

Nuclear and High Energy Physics,Radiation

Link

http://link.springer.com/content/pdf/10.1134/S086986431004013X.pdf

Reference5 articles.

1. Low-temperature plasma;M.F. Zhukov,1999

2. Patent RU2105928C1, Plasma-chemical method of treatment of gaseous and liquid halogen-organic waste. Registered in the State Register of Inventions on Feb. 27, 1998.

3. Patent RU2224178C1, Plasma-chemical method of treatment of gaseous and liquid halogen-organic waste. Registered in the State Register of Inventions on Feb. 20, 2004.

4. N. Maksimov, V.G. Barabanov, I.L. Serushkin et al., Industrial organofluoric products: Reference book, Revised and enlarged second edition, Khimia, St.-Petersburg, 1996.

5. I.A. Fedorov, Dioxins as Environmental Danger: Retrospective Review and Prospects, Nauka, Moscow, 1993.

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