Thermal Stability of TiZrAlN and TiZrSiN Films Formed by Reactive Magnetron Sputtering
Author:
Publisher
Pleiades Publishing Ltd
Subject
General Engineering,General Materials Science
Link
http://link.springer.com/content/pdf/10.1134/S2075113318030024.pdf
Reference39 articles.
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5. Vaz, F., Ferreira, J., Ribeiro, E., Rebouta, L., Lanceros-Méndez, S., Mendes, J.A., Alves, E., Goudeau, Ph., Rivière, J.P., Ribeiro, F., Moutinho, I., Pischow, K., and de Rijk, J., Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films, Surf. Coat. Technol., 2005, vol. 191, pp. 317–323.
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