A Self-aligned Process for Simultaneous Fabrication of Short Channel and Spacer in Semiconductor Devices
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Published:2024-06-30
Issue:3
Volume:24
Page:179-183
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ISSN:2233-4866
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Container-title:JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE
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language:en
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Short-container-title:JSTS
Author:
Park Jong-Kyung,Hong Seul-Ki
Publisher
The Institute of Electronics Engineers of Korea