Layout Optimization Method using an Inverse Narrow Width Effect in 32-nm CMOS
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Published:2018-10-31
Issue:5
Volume:18
Page:541-546
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ISSN:1598-1657
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Container-title:JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE
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language:en
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Short-container-title:JSTS
Publisher
The Institute of Electronics Engineers of Korea
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials