Gas-flame, high-temperature apparatus for single-crystal X-ray diffraction studies

Author:

Yamanaka Takamitsu,Takéuchi Yoshio,Sadanaga Ryoichi

Abstract

Abstract A new high-temperature gas-flame heater utilizing three different kinds of gases has been constructed for single-crystal diffractometry and for photography. The whole system of the heater consists of a burner and gas controller. The temperature control of the heater is carried out by changing the ratio of the flow rates of propane, oxygen and nitrogen gases; the third gas plays a role in increasing blower pressure of the flame and reducing fluctuation of the sample temperature. The heater can thus stably provide a temperature ranging from about 1000°C up to about 2000 °C within a deviation of ± 20 °C. The burner has at its end a nozzle head in which five holes are so opened that gas flowing through the holes converges to a point 10 mm distant from the head. An accessory device is described which facilitates measuring directly the sample temperatures during the collection of reflection intensities with the single-crystal diffractometer.

Publisher

Walter de Gruyter GmbH

Subject

Inorganic Chemistry,Condensed Matter Physics,General Materials Science

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