23.4: Invited Paper: Active-Matrix Backplanes Produced by Roll-to-Roll Self-Aligned Imprint Lithography (SAIL)-Reference-Cited by-同舟云学术

23.4: Invited Paper: Active-Matrix Backplanes Produced by Roll-to-Roll Self-Aligned Imprint Lithography (SAIL)

Published:2008 Issue:1 Volume:39 Page:322
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:SID Symposium Digest

Author:

Jackson Warren B.,Almanza-Workman Marcia,Chaiken Alison,Garcia Robert A.,Jeans Albert,Kwon Ohseung,Luo Hao,Mei Ping,Perlov Craig,Taussig Carl,Braymen Stephen,Jeffrey Frank,Hauschildt Jason

Publisher

Wiley

Reference2 articles.

1. From Micro- to Nanofabrication with Soft Materials

2. H.-J. Kim, M. Almanza-Workman, A. Chaiken, W. B. Jackson, A. Jeans, O. Kwon, H. Luo, P. Mei, C. Perlov, C. Taussig, F. Jeffrey, S. Braymen, J. Hauschildt, “Roll-to-roll fabrication of active-matrix backplanes using self-aligned imprint lithography (SAIL)” 6th Int. Meeting Information Disply/5th Int. Display Manufacturing Conf. Daegu, Korea, Digest pp. 1539–1543, 2006.

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