P-3: Development of CMOS Six Mask and PMOS Five Mask Poly-Si Architecture with RGB+White Color-Reference-Cited by-同舟云学术

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P-3: Development of CMOS Six Mask and PMOS Five Mask Poly-Si Architecture with RGB+White Color

Published:2004 Issue:1 Volume:35 Page:229
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:SID Symposium Digest

Author:

Yi Chung,Choi Pil-Mo,Kim Ung-Sik,Kim Dong-Byum,Kim Chi-Woo,Chung Kyuha

Publisher

Wiley

Reference4 articles.

1. P. M. Choi, etal, Korea Patent Applied (in process)

2. S. D. Lee and C. Y. Kim, Korea Patent Applied (in process)

3. U. S. Kim, P. M. Choi, T. H. Park, B. W. Lee, C. W. Park, S. G. Rho, H. J. Kim, C. Yi, U. Tsutomu, C. W. Kim and K. H. Chung,AM-LCD 03, pp227–230

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. P‐52: A Novel Six‐Mask Low‐Temperature Polycrystalline Silicon Architecture for TFT‐LCD Application;SID Symposium Digest of Technical Papers;2020-08

2. 7.2: Realization of 6Mask LTPS CMOS Panel for AMLCD Application;SID Symposium Digest of Technical Papers;2007-05

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