38.2: Deposition of Highly Conductive ITO Thin Films for Display Applications with the rf/dc Process-Reference-Cited by-同舟云学术

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38.2: Deposition of Highly Conductive ITO Thin Films for Display Applications with the rf/dc Process

Published:1999 Issue:1 Volume:30 Page:841
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:SID Symposium Digest

Author:

Bender M.,Trube J.,Stollenwerk J.

Publisher

Wiley

Reference8 articles.

1. R. Latz, K. Michael, M. Scherer, Ext. Abstr. 22ndConf. Sol. State Dev. Mat., Sendai, Japan, 1990, pp. 1059–1062

2. H. Frankenberger, C. Daube, J. Stollenwerk, M. Bender, A. Klöppel, F. Wette, DMTC Digest of technical papers, San Jose, 1997

3. Dependence of oxygen flow on optical and electrical properties of DC-magnetron sputtered ITO films

4. The Hall effect in polycrystalline and powdered semiconductors

5. M. Bender, J. Trube, J, Stollenwerk, 1998 (in review)

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. ZnO:Al Films Prepared by Reactive Mid-frequency Magnetron Sputtering with Rotating Cathode;Journal of Materials Science & Technology;2010-01

2. Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering;Thin Solid Films;2003-10

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