47.2: Invited Paper: TFT Application of Low-Temperature Deposited Cat-CVD Polysilicon Films
Author:
Publisher
Wiley
Reference9 articles.
1. N. Ibaraki:Digest of Technical Papers of 1995 Int. Workshop on Active-Matrix Liquid-Crsytal Displays, Osaka, 1995, p. 67.
2. Amorphous silicon produced by a new thermal chemical vapor deposition method using intermediate species SiF2
3. H. Matsumura, H. Ihara and H. Tachibana:Proc. 18th IEEE Photo voltaic Specialists Conf., Las Vegas, 1985, p. 1277.
4. Formation of Polysilicon Films by Catalytic Chemical Vapor Deposition (cat-CVD) Method
5. Hall Mobility of Low-Temperature-Deposited Polysilicon Films by Catalytic Chemical Vapor Deposition Method
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1. Optimization of low-temperature poly-Si TFT-LCDs and a large-scale production line for large glass substrates;Journal of the Society for Information Display;2001-09
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