Layer-thickness simulation for static thin-film deposition on Gen 6/Gen 7 substrates-Reference-Cited by-同舟云学术

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Layer-thickness simulation for static thin-film deposition on Gen 6/Gen 7 substrates

Published:2006 Issue:1 Volume:14 Page:31
ISSN:1071-0922
Container-title:Journal of the Society for Information Display
language:en
Short-container-title:J. Soc. Inf. Display

Author:

Lopp Andreas,Bangert Stefan,Buschbeck Wolfgang,Hanika Markus,König Michael,Krempel-Hesse Jörg,Rost Harald,Schroeder Jürgen,Stolley Tobias

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. Angular Distribution of Sputtered Material

2. R. E. Jones, “Theories of the distribution of deposit from sputtered disk and rectangular electrodes,”IBM Res Develop, 27–34 (1972).

3. Applications of Monte Carlo simulation in the analysis of a sputter‐deposition process

4. Intrinsic resputtering during film deposition investigated by Monte Carlo simulation

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