Etching of Si(100)-2×1 with chlorine: Reaction pathways, energy anisotropies, and atomic-scale phenomena
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.52.8288/fulltext
Reference19 articles.
1. Surface science aspects of etching reactions
2. Reaction mechanisms for the photon-enhanced etching of semiconductors: An investigation of the UV-stimulated interaction of chlorine with Si(100)
3. Chlorine bonding sites and bonding configurations on Si(100)–(2×1)
4. Semiconductor surface etching by halogens: Fundamental steps
5. Layer-by-layer etching of Si(100)-2×1 withBr2: A scanning-tunneling-microscopy study
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