Structural and dielectric properties of amorphousZrO2andHfO2
Author:
Publisher
American Physical Society (APS)
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.74.125108/fulltext
Reference18 articles.
1. Structure and dielectric properties of ultra-thin ZrO 2 films for high- k gate dielectric application prepared by pulsed laser deposition
2. Structural, electronic, and dielectric properties of amorphousZrO2fromab initiomolecular dynamics
3. Structural and dielectric properties of crystalline and amorphous ZrO2
4. Event-Based Relaxation of Continuous Disordered Systems
5. Activated mechanisms in amorphous silicon: An activation-relaxation-technique study
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