Structure and characteristics ofC3N4thin films prepared by rf plasma-enhanced chemical vapor deposition
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.56.4949/fulltext
Reference13 articles.
1. Prediction of New Low Compressibility Solids
2. Experimental Realization of the Covalent Solid Carbon Nitride
3. Structure and bonding studies of the C:N thin films produced by rf sputtering method
4. Analytical electron microscopy and Raman spectroscopy studies of carbon nitride thin films
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