Atomic force microscopy study of60−keVAr-ion-induced ripple patterns on Si(100)
Author:
Publisher
American Physical Society (APS)
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.69.235313/fulltext
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1. Patterning a surface on the nanometric scale by ion sputtering
2. Theory of ripple topography induced by ion bombardment
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5. Ion-induced effective surface diffusion in ion sputtering
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