Isolated interstitial hydrogen molecules in hydrogenated crystalline silicon
Author:
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.57.R15048/fulltext
Reference21 articles.
1. Concentration of atomic hydrogen diffused into silicon in the temperature range 900–1300 °C
2. Hydrogen‐accelerated thermal donor formation in Czochralski silicon
3. Interstitial O in Si and its interactions with H
4. Interaction of Hydrogen with Impurities in Semiconductors
5. Coupled-Barrier Diffusion: The Case of Oxygen in Silicon
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