Chemical trends in ground- and excited-state properties of interstitial3dimpurities in silicon

Author:

Katayama-Yoshida H.,Zunger Alex

Publisher

American Physical Society (APS)

Cited by 68 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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