Temperature influence on the production of nanodot patterns by ion beam sputtering of Si(001)-Reference-Cited by-同舟云学术

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Temperature influence on the production of nanodot patterns by ion beam sputtering of Si(001)

Published:2006-04-11 Issue:15 Volume:73 Page:
ISSN:1098-0121
Container-title:Physical Review B
language:en
Short-container-title:Phys. Rev. B

Author:

Gago R.,Vázquez L.,Plantevin O.,Sánchez-García J. A.,Varela M.,Ballesteros M. C.,Albella J. M.,Metzger T. H.

Publisher

American Physical Society (APS)

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.73.155414/fulltext

Reference40 articles.

1. Visible photoluminescence in Si+‐implanted thermal oxide films on crystalline Si

2. Structural properties of self-organized semiconductor nanostructures

3. Nanostructuring surfaces by ion sputtering

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