Relative importance of electrostatic and van der Waals forces in particle adhesion to rough conducting surfaces
Author:
Funder
National Science Foundation
Institut de Radioprotection et de SÛreté Nucléaire
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevE.103.042906/fulltext
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