Effect of thickness and surface composition on the stability of polarization in ferroelectric HfxZr1−xO2 thin films
Author:
Funder
National Science Foundation
Publisher
American Physical Society (APS)
Subject
Physics and Astronomy (miscellaneous),General Materials Science
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevMaterials.7.124401/fulltext
Reference74 articles.
1. Ferroelectricity in hafnium oxide thin films
2. Enhanced ferroelectricity in ultrathin films grown directly on silicon
3. Scale-free ferroelectricity induced by flat phonon bands in HfO2
4. High polarization, endurance and retention in sub-5 nm Hf0.5Zr0.5O2 films
5. Trilinear-coupling-driven ferroelectricity in HfO2
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1. Progress in computational understanding of ferroelectric mechanisms in HfO2;npj Computational Materials;2024-08-23
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