Atom nanolithography with multilayer light masks: Particle optics analysis
Author:
Publisher
American Physical Society (APS)
Subject
Atomic and Molecular Physics, and Optics
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevA.72.023417/fulltext
Reference26 articles.
1. Using light as a lens for submicron, neutral-atom lithography
2. One-, two-and three-dimensional nanostructures with atom lithography
3. Calculation of atomic positions in nanometer-scale direct-write optical lithography with an optical standing wave
4. Atom-optical properties of a standing-wave light field
5. High-contrast, high-resolution focusing of neutral atoms using light forces
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