Resonant Interferometric Lithography beyond the Diffraction Limit
Author:
Publisher
American Physical Society (APS)
Subject
General Physics and Astronomy
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevLett.100.073602/fulltext
Reference19 articles.
1. Interferometric lithography — from periodic arrays to arbitrary patterns
2. XXXI. Investigations in optics, with special reference to the spectroscope
3. Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit
4. Quantum-interferometric optical lithography: Towards arbitrary two-dimensional patterns
5. Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”
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