Relationship between scaling behavior and porosity of plasma-depositedTiO2thin films-Reference-Cited by-同舟云学术

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Relationship between scaling behavior and porosity of plasma-depositedTiO2thin films

Published:2007-12-04 Issue:23 Volume:76 Page:
ISSN:1098-0121
Container-title:Physical Review B
language:en
Short-container-title:Phys. Rev. B

Author:

Borrás A.,Yanguas-Gil A.,Barranco A.,Cotrino J.,González-Elipe A. R.

Publisher

American Physical Society (APS)

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.76.235303/fulltext

Reference44 articles.

1. Density and refractive index of TiO2 films prepared by reactive evaporation

2. Infrared ellipsometric study of SiO2 films: relationship between LO mode frequency and porosity

3. Optical and crystalline inhomogeneity in evaporated zirconia films

4. Optical inhomogeneity and microstructure of ZrO_2 thin films prepared by ion-assisted deposition

5. Characterization of inhomogeneous optical interference films using a complex parabolic profile model

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