Nanoscale dynamics during self-organized ion beam patterning of Si. II. Kr+ bombardment
Author:
Funder
National Science Foundation
U.S. Department of Energy
Brookhaven National Laboratory
Publisher
American Physical Society (APS)
Link
http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.103.195424/fulltext
Reference39 articles.
1. Effects of Mo seeding on the formation of Si nanodots during low-energy ion bombardment
2. Making waves: Kinetic processes controlling surface evolution during low energy ion sputtering
3. Self-Assembly of Ordered Semiconductor Nanoholes by Ion Beam Sputtering
4. The Ultrasmoothness of Diamond-like Carbon Surfaces
5. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
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1. Fractal characterizations of MeV ion treated CaF2 thin films;Chaos: An Interdisciplinary Journal of Nonlinear Science;2023-03-01
2. Nanoscale dynamics during self-organized ion beam patterning of Si. I. Ar+ bombardment;Physical Review B;2021-05-20
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