X-ray scattering by the fused silica surface etched by low-energy Ar ions-Reference-Cited by-同舟云学术

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X-ray scattering by the fused silica surface etched by low-energy Ar ions

Published:2019-10-17 Issue:5 Volume:27 Page:857-870
ISSN:0895-3996
Container-title:Journal of X-Ray Science and Technology
language:
Short-container-title:XST

Author:

Barysheva M.M.¹,Chkhalo N.I.¹,Drozdov M.N.¹,Mikhailenko M.S.¹,Pestov A.E.¹,Salashchenko N.N.¹,Vainer Y.A.¹,Yunin P.A.¹,Zorina M.V.¹

Affiliation:

1. Institute for Physics of Microstructures of the Russian Academy of Sciences, Nizhny Novgorod, Russia

Publisher

IOS Press

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Radiology, Nuclear Medicine and imaging,Instrumentation,Radiation

Reference51 articles.

1. X-ray and neutron scattering from rough surfaces;Sinha;Phys Rev B,1988

2. Diffuse scattering of hard x rays from rough surfaces;Weber;Rev B,1992

3. Neutron scattering by rough surfaces at grazing incidence;Pynn;Phys Rev B,1992

4. Nonspecular x-ray reflection from rough multilayers;Holy;Phys Rev B,1994

5. X-ray study of the roughness of surfaces and interfaces;Kozhevnikov;Proc SPIE,2000

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4. Influence of ion-beam etching by Ar ions with an energy of 200–1000 eV on the roughness and sputtering yield of a single-crystal silicon surface;Applied Optics;2022-03-28

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