Aggregation-induced emission photosensitizer for antibacterial therapy of methicillin-resistant <i>Staphylococcus aureus</i>-Reference-Cited by-同舟云学术

Aggregation-induced emission photosensitizer for antibacterial therapy of methicillin-resistant Staphylococcus aureus

Published:2024 Issue:46 Volume:60 Page:5960-5963
ISSN:1359-7345
Container-title:Chemical Communications
language:en
Short-container-title:Chem. Commun.

Author:

Kong Lin¹²^ORCID,Zhang Rongyuan²,Gong Junyi²,Wang Huan¹,Zhai Lingyu¹,Dang Dongfeng³^ORCID,Liu Qian⁴,Zhao Zheng²^ORCID,Tang Ben Zhong²⁵

Affiliation:

1. College of Chemistry and Chemical Engineering, Anhui University, Hefei 230601, P. R. China

2. School of Science and Engineering, Shenzhen Institute of Aggregate Science and Technology, The Chinese University of Hong Kong (CUHKSZ), Shenzhen, Guangdong 518172, China

3. School of Science, MOE Key Laboratory for Non-equilibrium Synthesis and Modulation of Condensed Matter, Xi’an Jiaotong University, Xi’an 710049, P. R. China

4. Department of Urology, Tianjin First Central Hospital, Tianjin 300192, China

5. Department of Chemistry, Hong Kong Branch of Chinese National Engineering Research Center for Tissue Restoration and Reconstruction, The Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong, China

Abstract

A cationic AIE-PS, MNNPyBB damages membrane/wall of methicillin-resistant bacteria. Wound closure was achieved with normal re-epithelialization and preserved skin morphology. This study facilitates the structural regulation, performance modulation of broad-spectrum antibiotics.

Funder

National Natural Science Foundation of China

Science, Technology and Innovation Commission of Shenzhen Municipality

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/CC/D4CC01022A

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