Flexible aluminum-doped hafnium oxide ferroelectric synapse devices for neuromorphic computing
Author:
Affiliation:
1. School of Microelectronics, Fudan University, Shanghai 200433, P. R. China
2. Zhangjiang Fudan International Innovation Center, Shanghai 201203, China
Abstract
Funder
National Natural Science Foundation of China
Science and Technology Commission of Shanghai Municipality
China Postdoctoral Science Foundation
National Key Research and Development Program of China
Publisher
Royal Society of Chemistry (RSC)
Subject
Electrical and Electronic Engineering,Process Chemistry and Technology,Mechanics of Materials,General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2023/MH/D3MH00645J
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