2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization-Reference-Cited by-同舟云学术

2D laser lithography on silicon substrates via photoinduced copper-mediated radical polymerization

Published:2018 Issue:7 Volume:54 Page:751-754
ISSN:1359-7345
Container-title:Chemical Communications
language:en
Short-container-title:Chem. Commun.

Author:

Laun Joachim¹²³⁴⁵,De Smet Yana¹²³⁴⁵,Van de Reydt Emma¹²³⁴⁵,Krivcov Alexander⁶⁷⁸,Trouillet Vanessa⁹¹⁰⁸¹¹¹⁰^ORCID,Welle Alexander¹¹¹⁰¹²⁸¹³,Möbius Hildegard⁶⁷⁸,Barner-Kowollik Christopher¹⁴¹⁵¹⁶¹⁷¹⁸^ORCID,Junkers Tanja¹²³⁴⁵^ORCID

Affiliation:

1. Polymer Reaction Design Group

2. Institute for Materials Research (IMO)

3. Universiteit Hasselt

4. 3500 Hasselt

5. Belgium

6. University of Applied Sciences Kaiserslautern

7. 66482 Zweibrücken

8. Germany

9. Institute for Applied Materials (IAM)

10. Karlsruhe Institute of Technology (KIT)

11. Karlsruhe Nano Micro Facility (KNMF)

12. 76344 Eggenstein-Leopoldshafen

13. Institute of Functional Interfaces

14. School of Chemistry

15. Physics and Mechanical Engineering

16. Queensland University of Technology (QUT)

17. Brisbane

18. Australia

Abstract

A 2D laser lithography protocol for controlled grafting of polymer brushes in a single-step is presented.

Funder

Fonds Wetenschappelijk Onderzoek

Australian Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,General Chemistry,Ceramics and Composites,Electronic, Optical and Magnetic Materials,Catalysis

Link

http://pubs.rsc.org/en/content/articlepdf/2018/CC/C7CC08444G

Reference32 articles.

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