Polarisation-independent ultrafast laser selective etching processing in fused silica-Reference-Cited by-同舟云学术

Polarisation-independent ultrafast laser selective etching processing in fused silica

Published:2023 Issue:7 Volume:23 Page:1752-1757
ISSN:1473-0197
Container-title:Lab on a Chip
language:en
Short-container-title:Lab Chip

Author:

Ochoa Mario¹²³^ORCID,Roldán-Varona Pablo¹²³,Algorri José Francisco¹²³,López-Higuera José Miguel¹²³,Rodríguez-Cobo Luis¹²³

Affiliation:

1. Photonics Engineering Group, Universidad de Cantabria, 39005 Santander, Spain

2. Instituto de Investigación Sanitaria Valdecilla (IDIVAL), 39011 Santander, Spain

3. CIBER de Bioingeniería, Biomateriales y Nanomedicina, Instituto de Salud Carlos III, 28029 Madrid, Spain

Abstract

Few pulses and suitable low-energy femtosecond laser parameters achieve high etching rates (about 300 μm h−1) without the need to control the light polarisation, enabling the fabrication of 3D complex geometries within reasonable etching times.

Funder

Agencia Estatal de Investigación

European Regional Development Fund

Ministerio de Ciencia, Innovación y Universidades

Publisher

Royal Society of Chemistry (RSC)

Subject

Biomedical Engineering,General Chemistry,Biochemistry,Bioengineering

Link

http://pubs.rsc.org/en/content/articlepdf/2023/LC/D3LC00052D

Reference34 articles.

1. Fundamentals of Femtosecond Laser Modification of Bulk Dielectrics

2. Femtosecond laser micromachining in transparent materials

3. Self-Organized Nanogratings in Glass Irradiated by Ultrashort Light Pulses

4. Ultrafast nanoporous silica formation driven by femtosecond laser irradiation

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