Fabrication of graphitic-C3N4 quantum dots coated silicon nanowire array as a photoelectrode for vigorous degradation of 4-chlorophenol-Reference-Cited by-同舟云学术

Fabrication of graphitic-C3N4 quantum dots coated silicon nanowire array as a photoelectrode for vigorous degradation of 4-chlorophenol

Author:

Su Yan¹²³⁴⁵,Sun Bo¹²³⁴⁵^ORCID,Chen Shuo⁶⁷⁸⁴⁵,Yu Hongtao⁶⁷⁸⁴⁵,Liu Jing¹²³⁴⁵

Affiliation:

1. Faculty of Chemical

2. Environmental and Biological Science and Technology

3. School of Chemistry

4. Dalian University of Technology

5. Dalian 116024

6. Key Laboratory of Industrial Ecology and Environmental Engineering

7. Ministry of Education

8. School of Environmental Science and Technology

Abstract

This work explores the function of g-C₃N₄ QDs coated on SiNWs for inhibited oxidation passivation and vigorous photoelectrocatalytic capability.

Funder

National Natural Science Foundation of China

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

Reference27 articles.

Cited by 21 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献