A general acetic acid vapour etching strategy to synthesize layered carbon nitride with carbon vacancies for efficient photoredox catalysis-Reference-Cited by-同舟云学术

A general acetic acid vapour etching strategy to synthesize layered carbon nitride with carbon vacancies for efficient photoredox catalysis

Published:2022 Issue:32 Volume:10 Page:16873-16882
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Zhao Jianghong¹,Mu Rihui¹,Zhang Ya²,Yang Zhidong²,Zhang Hongxia²^ORCID,Shi Hu²³^ORCID,Zhang Min²,Zheng Zhanfeng⁴^ORCID,Yang Pengju²⁴^ORCID

Affiliation:

1. Engineering Research Center of Ministry of Education for Fine Chemicals, Shanxi University, Taiyuan 030006, China

2. School of Chemistry and Chemical Engineering, Shanxi University, Taiyuan 030006, China

3. Institute of Molecular Science, Shanxi University, Taiyuan 030006, China

4. State Key Laboratory of Coal Conversion, Institute of Coal Chemistry, Chinese Academy of Sciences, Taiyuan 030001, China

Abstract

A chemical etching strategy has been developed to prepare polymeric carbon nitride (PCN) nanosheets with carbon vacancies (CVs). The CVs can regulate the electronic properties of the Pt cocatalyst, thereby achieving superior hydrogen production.

Funder

National Natural Science Foundation of China

ShanXi Science and Technology Department

Natural Science Foundation of Shanxi Province

State Key Laboratory of Coal Conversion, Institute of Coal Chemistry, Chinese Academy of Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/TA/D2TA04279G

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