Simple realization of efficient barrier performance of a single layer silicon nitride film via plasma chemistry
Author:
Affiliation:
1. Center for Advanced Plasma Surface Technology (CAPST)
2. NU-SKKU Joint Institute for Plasma Nano Materials
3. Department of Advanced Materials Science and Engineering
4. Sungkyunkwan University
5. Suwon 440-746
Abstract
The essence and effect of plasma chemistry control on the growth and properties of barrier films is studied.
Funder
Ministry of Science, ICT and Future Planning
Korea Institute for Advancement of Technology
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2016/CP/C6CP06722K
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