Photopolymerization activated by photobase generators and applications: from photolithography to high-quality photoresists-Reference-Cited by-同舟云学术

Photopolymerization activated by photobase generators and applications: from photolithography to high-quality photoresists

Published:2024 Issue:4 Volume:15 Page:248-268
ISSN:1759-9954
Container-title:Polymer Chemistry
language:en
Short-container-title:Polym. Chem.

Author:

Pei Han-Wen¹²^ORCID,Ye Kai³,Shao Yizhi³,Chen Dan³,Sun Zhao-Yan¹²^ORCID,Gong Tao³,Liu Dandan⁴,Sun Ke³⁵^ORCID

Affiliation:

1. State Key Laboratory of Polymer Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun, 130022, China

2. School of Applied Chemistry and Engineering, University of Science and Technology of China, Hefei, 230026, China

3. Institute of Intelligent Manufacturing Technology, Shenzhen Polytechnic University, 4089 Shahe West Road, Shenzhen, 518055, China

4. FAW-Volkswagen Automotive Co. Ltd., Changchun, 130021, China

5. Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, Shenzhen, 518055, China

Abstract

Light-induced polymerization has become a very attractive technology for advanced manufacturing of polymers.

Funder

Shenzhen Polytechnic

State Key Lab of Digital Manufacturing Equipment and Technology

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/PY/D3PY00992K

Reference104 articles.

1. Visible light sensitive photoinitiating systems: Recent progress in cationic and radical photopolymerization reactions under soft conditions

2. Photoinduced free radical promoted cationic polymerization 40 years after its discovery

3. Organic dye‐based photoinitiating systems for visible‐light‐induced photopolymerization

4. Light-Controlled Radical Polymerization: Mechanisms, Methods, and Applications

5. N-naphthalimide ester derivatives as Type Ⅰ photoinitiators for LED photopolymerization

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