Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry (DC-GD-OES)-Reference-Cited by-同舟云学术

Analysis of gaseous reaction products of wet chemical silicon etching by conventional direct current glow discharge optical emission spectrometry (DC-GD-OES)

Published:2011 Issue:10 Volume:26 Page:1990
ISSN:0267-9477
Container-title:Journal of Analytical Atomic Spectrometry
language:en
Short-container-title:J. Anal. At. Spectrom.

Author:

Hoffmann Volker,Steinert Marco,Acker Jörg

Publisher

Royal Society of Chemistry (RSC)

Subject

Spectroscopy,Analytical Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2011/JA/C1JA10033E

Reference59 articles.

1. Floating zone growth of CuO under elevated oxygen pressure and its relevance for the crystal growth of cuprates

2. Glow discharge atomic emission spectrometry as a detector in gas chromatography for mercury speciation

3. Glow discharge atomic spectrometry for the analysis of environmental samples ? a review

4. Mercury speciation by capillary gas chromatography with radiofrequency hollow cathode glow discharge atomic emission detection

5. Trace gas measurements using optically resonant cavities and quantum cascade lasers operating at room temperature

Cited by 26 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Extremely high selective Si1−xGex-film wet etchant generating highly dissolved oxygen via peracetic acid oxidant for lateral gate-all-around FETs with a logic node of less than 3-nm;Chemical Engineering Journal;2023-11

2. Kinetic studies on acidic wet chemical etching of silicon in binary and ternary mixtures of HF, HNO₃ and H₂SiF₆;Physical Chemistry Chemical Physics;2023

3. Novel chemical texturizing process in Boron–doped As-cut multi-crystalline silicon wafer for increasing the optical properties;Applied Surface Science Advances;2022-12

4. Comprehensive stoichiometric studies on the reaction of silicon in HF/HNO₃ and HF/HNO₃/H₂SiF₆ mixtures;Physical Chemistry Chemical Physics;2022

5. Metal-Assisted Catalytic Etching (MACE) for Nanofabrication of Semiconductor Powders;Micromachines;2021-06-30