Micro- and nano-patterns fabricated by embossed microscale stamp with trenched edges-Reference-Cited by-同舟云学术

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Micro- and nano-patterns fabricated by embossed microscale stamp with trenched edges

Published:2017 Issue:51 Volume:7 Page:32058-32064
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Choi Jin-Hyun¹²³⁴,Oh Chang-Mok¹²³⁴,Jang Jae-Won¹²³⁴^ORCID

Affiliation:

1. Department of Physics

2. Pukyong National University

3. Busan 608-737

4. Korea

Abstract

Micro- and nano-patterns of gold are fabricated by sequential etching after alkanethiol printing by an embossed microscale stamp with trenched edges.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2017/RA/C7RA05262F

Reference26 articles.

1. Nanofabrication by electron beam lithography and its applications: A review

2. Electron beam lithography process for T- and Γ-shaped gate fabrication using chemically amplified DUV resists and PMMA

3. Sub-10 nm electron beam lithography using cold development of poly(methylmethacrylate)

4. Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography

5. Rapid and three-dimensional nanoimprint template fabrication technology using focused ion beam lithography

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1. Aluminum Hydroxide Nano- and Microstructures Fabricated Using Scanning Probe Lithography with KOH Ink;ACS Omega;2023-03-08

2. Advanced unconventional techniques for sub‐100 nm nanopatterning;InfoMat;2022-05-18

3. Nanoimprint lithography for high-throughput fabrication of metasurfaces;Frontiers of Optoelectronics;2021-04-13

4. Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography;Advanced Materials;2020-04-03

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