Directly written photo-crosslinked fluorinated polycarbonate photoresist materials for second-order nonlinear optical (NLO) applications-Reference-Cited by-同舟云学术

Directly written photo-crosslinked fluorinated polycarbonate photoresist materials for second-order nonlinear optical (NLO) applications

Published:2019 Issue:16 Volume:7 Page:4667-4672
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Ding Shuxiang¹²³⁴⁵,Wang Chunxue⁶³⁴⁵,Shi Xiaoyu¹²³⁴⁵,Zou Jiawei¹²³⁴⁵,Cheng Qiuli¹²³⁴⁵,Zhu Jiufu¹²³⁴⁵,Shi Zuosen¹²³⁴⁵,Cai Zhenzhen⁷⁸⁹¹⁰,Chen Changming⁶³⁴⁵,Cui Zhanchen¹²³⁴⁵^ORCID

Affiliation:

1. State Key Laboratory of Supramolecular Structure and Materials

2. College of Chemistry

3. Jilin University

4. Changchun 130012

5. P. R. China

6. State Key Lab on Integrated Opto-electronics

7. Key Laboratory of Functional Materials and Devices for Special Environments

8. Chinese Academy of Sciences

9. Urumqi 830011

10. China

Abstract

With AF-Z-PC MAs and AF-Ali-PC MAs as the functional layer, we successfully obtained straight and Y structure waveguides by a direct writing method for electro-optical modulator devices.

Funder

National Natural Science Foundation of China

Jilin University

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C9TC00396G

Reference41 articles.

1. Optical modulation and detection in slotted Silicon waveguides

2. Efficient Synthesis and Structural Characteristics of Zwitterionic Twisted π-Electron System Biaryls