Thermal control of SZ2080 photopolymerization in four-beam interference lithography-Reference-Cited by-同舟云学术

Thermal control of SZ2080 photopolymerization in four-beam interference lithography

Published:2020 Issue:9 Volume:22 Page:5038-5045
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Prielaidas Žygimantas¹²³⁴,Juodkazis Saulius⁵⁶⁷⁸⁹^ORCID,Stankevičius Evaldas¹²³⁴^ORCID

Affiliation:

1. Department of Laser Technologies

2. Center for Physical Sciences and Technology

3. Vilnius

4. Lithuania

5. Centre for Micro-Photonics and ARC Training Centre in Surface Engineering for Advanced Materials (SEAM)

6. School of Science

7. Swinburne University of Technology

8. Hawthorn

9. Australia

Abstract

Photopolymerization by four-beam interference lithography on a preheated SZ2080 sample was explored at different initial temperatures of the sample: 20 °C, 50 °C, 75 °C, 100 °C, 125 °C, and 150 °C, and at exposure times ranging from 0.5 s to 5 s.

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2020/CP/C9CP05168F

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