Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions-Reference-Cited by-同舟云学术

Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions

Published:2021 Issue:36 Volume:50 Page:12583-12591
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

El Jamal Ghada¹^ORCID,Gouder Thomas²,Eloirdi Rachel²,Tereshina-Chitrova Evgenia³⁴,Horákd Lukáš⁴,Jonsson Mats¹^ORCID

Affiliation:

1. School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Department of Chemistry, Applied Physical Chemistry, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden

2. European Commission, Joint Research Centre, Postfach 2340, DE-76215 Karlsruhe, Germany

3. Institute of Physics, ASCR, Prague, Czech Republic

4. Faculty of Mathematics and Physics, Charles University, 12116 Prague, Czech Republic

Abstract

X-ray photoelectron spectroscopy (XPS) has been used to study the effect of mixed H2O/H2 gas plasma on the surfaces of UO2, U2O5 and UO3 thin films at 400 °C.

Funder

Svensk Kärnbränslehantering

H2020 Euratom

European Regional Development Fund

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2021/DT/D1DT01020D

Reference38 articles.

1. Uranium(IV) hydrolysis constants and solubility product of UO2.cntdot.xH2O(am)