Light-induced electrostatic lithography: selective discharge of electrets by utilizing photothermal conversion of Ti3C2Tx MXene-Reference-Cited by-同舟云学术

Light-induced electrostatic lithography: selective discharge of electrets by utilizing photothermal conversion of Ti3C2Tx MXene

Published:2020 Issue:36 Volume:8 Page:19022-19027
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Ma Hui¹²³⁴,Cheng Haoge⁵⁶⁷⁴,Ma Xinlei⁸⁹¹⁰⁴,Wang Sen¹¹³⁴,Zhou Zhuqing¹²¹³¹⁴⁴,Chai Yuqiao¹²³⁴,Chen Ruoqi¹²³⁴,Zhang Xinyue⁵⁶⁷⁴^ORCID,He Yonglin⁸⁹¹⁰⁴^ORCID,Wang Yapei⁸⁹¹⁰⁴^ORCID,Li Yan¹¹³⁴^ORCID,Wang Xusheng¹²³⁴,Li Rui¹²¹³¹⁴⁴^ORCID,Ma Ning⁵⁶⁷⁴^ORCID,Xue Mianqi¹²³⁴¹⁵^ORCID

Affiliation:

1. Technical Institute of Physics and Chemistry

2. Chinese Academy of Sciences

3. Beijing

4. China

5. College of Materials Science and Chemical Engineering

6. Harbin Engineering University

7. Harbin

8. Department of Chemistry

9. Renmin University of China

10. Beijing 100872

11. University of Science and Technology Beijing

12. School of Advanced Materials

13. Peking University Shenzhen Graduate School

14. Shenzhen

15. Beijing National Laboratory for Molecular Sciences

Abstract

A novel light-induced electrostatic lithography is developed by combining in situ photothermal conversion with selective thermally stimulated discharging.

Funder

National Natural Science Foundation of China

Chinese Academy of Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2020/TA/D0TA06094A

Reference52 articles.

1. Fabrication of Transistors on Flexible Substrates: from Mass-Printing to High-Resolution Alternative Lithography Strategies

2. Physics of electrophotography