Chemical vapour deposition of rhenium disulfide and rhenium-doped molybdenum disulfide thin films using single-source precursors

Author:

Al-Dulaimi Naktal123,Lewis David J.12342,Zhong Xiang Li423,Azad Malik M.423,O'Brien Paul12342

Affiliation:

1. School of Chemistry

2. The University of Manchester

3. UK

4. School of Materials

Abstract

Polycrystalline thin films of rhenium disulfide (ReS2) and the alloys Mo1−xRexS2 (0 ≤ x ≤ 0.06) have been deposited by aerosol-assisted chemical vapour deposition (AA-CVD) using [Re(μ-SiPr)3(SiPr)6] and [Mo(S2CNEt2)4] at 475 °C.

Funder

Engineering and Physical Sciences Research Council

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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