A vertical WSe2–MoSe2 p–n heterostructure with tunable gate rectification

Author:

Liu Hailing12345ORCID,Hussain Sajjad12345,Ali Asif12345,Naqvi Bilal Abbas12345,Vikraman Dhanasekaran6784ORCID,Jeong Woonyoung12345,Song Wooseok9101112ORCID,An Ki-Seok9101112ORCID,Jung Jongwan12345ORCID

Affiliation:

1. Graphene Research Institute

2. Sejong University

3. Seoul 143-747

4. Republic of Korea

5. Institute of Nano and Advanced Materials Engineering

6. Division of Electronics and Electrical Engineering

7. Dongguk University-Seoul

8. Seoul 04620

9. Thin Film Materials Research Center

10. Korea Research Institute of Chemical Technology

11. Daejon 305-600

12. Korea

Abstract

Here, we report a vertical MoSe2/WSe2 p–n heterostructure with rectifying IV behavior and back-gate tunability.

Funder

National Research Foundation of Korea

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

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