Thermal atomic layer deposition of Er<sub>2</sub>O<sub>3</sub> films from a volatile, thermally stable enaminolate precursor-Reference-Cited by-同舟云学术

Thermal atomic layer deposition of Er₂O₃ films from a volatile, thermally stable enaminolate precursor

Published:2023 Issue:32 Volume:52 Page:11096-11103
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Jayakodiarachchi Navoda¹,Liu Rui²^ORCID,Dharmadasa Chamod D.¹,Hu Xiaobing³^ORCID,Savage Donald E.²,Ward Cassandra L.¹,Evans Paul G.²^ORCID,Winter Charles H.¹^ORCID

Affiliation:

1. Department of Chemistry, Wayne State University, Detroit, Michigan 48202, USA

2. Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

3. Department of Materials Science and Engineering and Atomic and Nanoscale Characterization Experimental Center, Northwestern University, Evanston, Illinois 60208, USA

Abstract

The thermal atomic layer deposition of Er2O3 thin films is presented using an erbium(iii) enaminolate precursor and water. High purity films result and perfect conformal film coverage is obtained in nanoscale trenches.

Funder

National Institute of General Medical Sciences

Division of Materials Research

Division of Chemistry

Division of Electrical, Communications and Cyber Systems

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/DT/D3DT01824E

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