Towards an electronic grade nanoparticle-assembled silicon thin film by ballistic deposition at room temperature: the deposition method, and structural and electronic properties

Author:

Nava Giorgio123,Fumagalli Francesco123ORCID,Gambino Salvatore45637ORCID,Farella Isabella89103,Dell'Erba Giorgio123,Beretta Davide123ORCID,Divitini Giorgio11121314,Ducati Caterina11121314,Caironi Mario123ORCID,Cola Adriano89103,Di Fonzo Fabio123

Affiliation:

1. Center for Nano Science and Technology @PoliMI Istituto Italiano di Tecnologia

2. Milano

3. Italy

4. Dipartimento di Matematica e Fisica “Ennio De Giorgi”

5. Università del Salento

6. Lecce

7. CNR NANOTEC–Istituto di Nanotecnologia

8. Institute for Microelectronics and Microsystems—Unit of Lecce

9. National Council of Research (IMM/CNR)

10. 73100 Lecce

11. Department of Materials Science and Metallurgy

12. University of Cambridge

13. CB3 0FS Cambridge

14. UK

Abstract

High-throughput plasma synthesis of highly crystalline nanoparticle-assembled silicon thin films.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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