Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon-Reference-Cited by-同舟云学术

Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon

Published:2018 Issue:17 Volume:20 Page:12166-12174
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Gedvilas Mindaugas¹²³^ORCID,Indrišiūnas Simonas¹²³,Voisiat Bogdan¹²³⁴⁵,Stankevičius Evaldas¹²³,Selskis Algirdas¹²³,Račiukaitis Gediminas¹²³

Affiliation:

1. Center for Physical Sciences and Technology

2. LT-02300 Vilnius

3. Lithuania

4. Institut für Fertigungstechnik

5. Technische Universität Dresden

Abstract

New semi-empirical equation combining thermal modulation depth, interference period, laser pulse duration and thermal diffusivity for LIA quality is introduced.

Funder

Lietuvos Mokslo Taryba

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2018/CP/C7CP08458G

Reference81 articles.

1. Silicon nanostructures for photonics and photovoltaics

2. Recent advances in antireflective surfaces based on nanostructure arrays

3. Femtosecond laser welded nanostructures and plasmonic devices

4. Laser-induced plasmonic colours on metals

5. Directional visible light scattering by silicon nanoparticles

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