Nanoscale thermal diffusion during the laser interference ablation using femto-, pico-, and nanosecond pulses in silicon
Author:
Affiliation:
1. Center for Physical Sciences and Technology
2. LT-02300 Vilnius
3. Lithuania
4. Institut für Fertigungstechnik
5. Technische Universität Dresden
Abstract
New semi-empirical equation combining thermal modulation depth, interference period, laser pulse duration and thermal diffusivity for LIA quality is introduced.
Funder
Lietuvos Mokslo Taryba
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2018/CP/C7CP08458G
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