Built-in tensile strain dependence on the lateral size of monolayer MoS<sub>2</sub> synthesized by liquid precursor chemical vapor deposition-Reference-Cited by-同舟云学术

Built-in tensile strain dependence on the lateral size of monolayer MoS₂ synthesized by liquid precursor chemical vapor deposition

Published:2023 Issue:35 Volume:15 Page:14669-14678
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Seravalli L.¹^ORCID,Esposito F.¹²,Bosi M.¹^ORCID,Aversa L.³^ORCID,Trevisi G.¹,Verucchi R.³^ORCID,Lazzarini L.¹,Rossi F.¹^ORCID,Fabbri F.⁴^ORCID

Affiliation:

1. Institute of Materials for Electronics and Magnetism (IMEM-CNR), Parco Area delle Scienze 37/a, 43124 Parma, Italy

2. Department of Mathematical, Physical and Computer Sciences, University of Parma, Parco Area delle Scienze 7/a, 43124 Parma, Italy

3. Institute of Materials for Electronics and Magnetism (IMEM-CNR), FBK Trento unit, Via alla Cascata 56/C, 38123 Povo, Trento, Italy

4. NEST, Istituto Nanoscienze – CNR, Scuola Normale Superiore, Piazza San Silvestro 12, 56127 Pisa, Italy

Abstract

In this work, the authors unveil the depedance of the tensile strain and the size of MoS2 monolayer grown by liquid precursor chemical vapor deposition.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2023/NR/D3NR01687K

Reference80 articles.

1. Strain Engineering of 2D Materials: Issues and Opportunities at the Interface

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