Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers-Reference-Cited by-同舟云学术

Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers

Published:2019 Issue:6 Volume:7 Page:1720-1725
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Chen Qingzhi¹²³⁴^ORCID,Switzer Jay A.¹²³⁴^ORCID

Affiliation:

1. Missouri University of Science & Technology

2. Department of Chemistry and Graduate Center for Materials Research

3. Rolla

4. USA

Abstract

Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath.

Funder

Basic Energy Sciences

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C8TC06002A

Reference26 articles.

1. Schottky barrier height measurements of Cu/Si(001), Ag/Si(001), and Au/Si(001) interfaces utilizing ballistic electron emission microscopy and ballistic hole emission microscopy

2. Differential expression of microRNAs during fiber development between fuzzless-lintless mutant and its wild-type allotetraploid cotton

3. Plasmonic Nanolaser Using Epitaxially Grown Silver Film

4. Epitaxial growth of silver nanoislands on the surface of silicon nanowires in ambient air

5. Intrinsic Optical Properties and Enhanced Plasmonic Response of Epitaxial Silver

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