Inherent characteristics of ultra-photosensitive Al/Cu–CeO2/p-Si metal oxide semiconductor diodes

Author:

Manikandan V.1ORCID,Marnadu R.2,Chandrasekaran J.3ORCID,Vigneselvan S.4,Mane R. S.5ORCID,Banks Craig E.6ORCID,Mirzaei Ali7

Affiliation:

1. Department of Physics, Kongunadu Arts and Science College, Coimbatore – 641 029, India

2. PG Department of Physics, G.T.N. Arts College, Dindigul 624 005, India

3. Department of Physics, Sri Ramakrishna Mission Vidyalaya College of Arts and Science, Coimbatore 641 020, India

4. Department of Physics, Government College of Technology, Coimbatore 641 013, India

5. Center for Nanomaterial & Energy Devices, Swami Ramanand Teerth Marathwada University, Dnyanteerth, Vishnupuri, Nanded 431606, India

6. Faculty of Science and Engineering, Manchester Metropolitan University, Chester Street, Manchester M1 5GD, UK

7. Department of Materials Science and Engineering, Shiraz University of Technology, Shiraz, Iran

Abstract

An ultrahigh photosensitive diode was developed using a Cu-doped CeO2thin film through spray pyrolysis processing, which has made a unique contribution in the field of optoelectronic device fabrication process.

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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