SON68 glass alteration under Si-rich solutions at low temperature (35–90 °C): kinetics, secondary phases and isotopic exchange studies
Author:
Affiliation:
1. SUBATECH – Ecole des Mines de Nantes-CNRS/IN2P3-Université de Nantes
2. 44307 Nantes
3. France
4. CEA Marcoule DTCD SECM LCLT
5. 30207 Bagnols-Sur-Cèze
Abstract
Pristine and 29Si-doped SON68 glass were leached in dynamic mode in Si-rich COx water at 42 ppm, pH 8, (35–90 °C) and S/V (900–1800 m−1). Diffusion and surface reaction process governed the glass alteration. The residual rate at 90 °C to 653 days is about 10−3 g m−2 d−1.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Chemical Engineering,General Chemistry
Link
http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA12404F
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