SON68 glass alteration under Si-rich solutions at low temperature (35–90 °C): kinetics, secondary phases and isotopic exchange studies-Reference-Cited by-同舟云学术

SON68 glass alteration under Si-rich solutions at low temperature (35–90 °C): kinetics, secondary phases and isotopic exchange studies

Published:2016 Issue:76 Volume:6 Page:72616-72633
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Bouakkaz Rachid¹²³,Abdelouas Abdesselam¹²³,El Mendili Yassine¹²³,Grambow Bernd¹²³,Gin Stéphane⁴⁵³

Affiliation:

1. SUBATECH – Ecole des Mines de Nantes-CNRS/IN2P3-Université de Nantes

2. 44307 Nantes

3. France

4. CEA Marcoule DTCD SECM LCLT

5. 30207 Bagnols-Sur-Cèze

Abstract

Pristine and ²⁹Si-doped SON68 glass were leached in dynamic mode in Si-rich COx water at 42 ppm, pH 8, (35–90 °C) and S/V (900–1800 m⁻¹). Diffusion and surface reaction process governed the glass alteration. The residual rate at 90 °C to 653 days is about 10⁻³ g m⁻² d⁻¹.

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA12404F

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