High-quality, large-area MoSe2 and MoSe2/Bi2Se3 heterostructures on AlN(0001)/Si(111) substrates by molecular beam epitaxy
Author:
Affiliation:
1. Institute of Nanoscience and Nanotechnology
2. Athens, Greece
3. Physics Department
4. Aristotle University of Thessaloniki
5. GR-54124 Thessaloniki, Greece
6. Imec
7. Leuven, Belgium
Abstract
Atomically thin MoSe2 films grown epitaxially on AlN by MBE have high crystallinity, smooth surface and interface morphology, and sizable semiconductor band gap for use in nanoelectronics.
Publisher
Royal Society of Chemistry (RSC)
Subject
General Materials Science
Link
http://pubs.rsc.org/en/content/articlepdf/2015/NR/C4NR06874B
Reference41 articles.
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