Shock-tube study of the decomposition of tetramethylsilane using gas chromatography and high-repetition-rate time-of-flight mass spectrometry
Author:
Affiliation:
1. IVG
2. Institute for Combustion and Gas Dynamics – Reactive Fluids and CENIDE
3. Center for Nanointegration Duisburg-Essen
4. University of Duisburg-Essen
5. 47057 Duisburg
Abstract
The decomposition of tetramethylsilane was studied in shock-tube experiments in a temperature range of 1270–1580 K and pressures ranging from 1.5 to 2.3 bar behind reflected shock waves combining GC/MS and HRR-TOF-MS.
Funder
Deutsche Forschungsgemeinschaft
Horizon 2020 Framework Programme
Publisher
Royal Society of Chemistry (RSC)
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://pubs.rsc.org/en/content/articlepdf/2018/CP/C7CP06827A
Reference33 articles.
1. High-Temperature Chemical Vapor Deposition for SiC Single Crystal Bulk Growth Using Tetramethylsilane as a Precursor
2. Synthesis of α-SiC from tetramethylsilane by chemical vapor deposition at high temperature
3. A morphological and structural study of SiC layers obtained by LPCVD using tetramethylsilane
4. A thermodynamical approach to tetramethylsilane (TMS) pyrolysis; application to SiC coatings obtained by MOCVD
5. Investigation of the chemical vapor deposition of silicon carbide from tetramethylsilane by in situ temperature and gas composition measurements
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